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1

Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling

Fomenkov, Igor, Brandt, David, Ershov, Alex, Schafgans, Alexander, Tao, Yezheng, Vaschenko, Georgiy, Rokitski, Slava, Kats, Michael, Vargas, Michael, Purvis, Michael, Rafac, Rob, La Fontaine, Bruno, D

Journal:

Advanced Optical Technologies

Language:

english

File:

PDF, 1.06 MB

english

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - An intelligent imaging system for ArF scanner

Matsuyama, Tomoyuki, Ohmura, Yasuhiro, Nakashima, Toshiharu, Uehara, Yusaku, Ogata, Taro, Nishinaga, Hisashi, Ikezawa, Hironori, Toki, Tsuyoshi, Rokitski, Slava, Bonafede, James

Year:

2008

Language:

english

File:

PDF, 634 KB

english, 2008

3

[IEEE 2005 IEEE LEOS Annual Meeting - Sydney, Australia (23-27 Oct. 2005)] 2005 IEEE LEOS Annual Meeting Conference Proceedings - Characterization of surface plasmon polariton pulse propagation on thin metallic films and two dimensional nanohole arrays

Tetz, K.A., Rokitski, R., Nezhad, M., Fainman, Y.

Year:

2005

Language:

english

File:

PDF, 116 KB

english, 2005

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Performance optimization of MOPA pre-pulse LPP light source

Wood, Obert R., Panning, Eric M., Schafgans, Alexander A., Brown, Daniel J., Fomenkov, Igor V., Sandstrom, Rick, Ershov, Alex, Vaschenko, Georgiy, Rafac, Rob, Purvis, Michael, Rokitski, Slava, Tao, Ye

Year:

2015

Language:

english

File:

PDF, 955 KB

english, 2015

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Advanced light source technologies that enable high-volume manufacturing of DUV lithography extensions

Cacouris, Theodore, Rao, Rajasekhar, Rokitski, Rostislav, Jiang, Rui, Melchior, John, Burfeindt, Bernd, O'Brien, Kevin, Conley, Will

Year:

2012

Language:

english

File:

PDF, 437 KB

english, 2012

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Flexible power 90W to 120W ArF immersion light source for future semiconductor lithography

Lai, Kafai, Erdmann, Andreas, Burdt, R., Thornes, J., Duffey, T., Bibby, T., Rokitski, R., Mason, E., Melchior, J., Aggarwal, T., Haran, D., Wang, J., Rechtsteiner, G., Haviland, M., Brown, D.

Year:

2014

Language:

english

File:

PDF, 1.87 MB

english, 2014

7

Effect of inosine supplementation on 3-mile treadmill run performance and &OV0312;o2 peak

WILLIAMS, MELVIN H., KREIDER, RICHARD B., HUNTER, DAVID W., SOMMA, C. THOMAS, SHALL, LAWRENCE M., WOODHOUSE, MICHAEL L., ROKITSKI, LOTHAR

Journal:

Medicine & Science in Sports & Exercise

Year:

1990

File:

PDF, 593 KB

1990

8

SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Flexible 60-90W ArF light source for double patterning immersion lithography in high volume manufacturing

Rokitski, Slava, Chen, Alek C., Han, Woo-Sung, Ishihara, Toshi, Rao, Rajeskar, Lin, Burn J., Yen, Anthony, Jiang, Rui, Riggs, Daniel, Haviland, Mary, Cacouris, Theodore, Brown, Daniel

Year:

2009

Language:

english

File:

PDF, 303 KB

english, 2009

9

Time-domain waveform processing by chromatic dispersion for temporal shaping of optical pulses

Saperstein, Robert E., Alić, Nikola, Panasenko, Dmitriy, Rokitski, Rostislav, Fainman, Yeshaiahu

Journal:

Journal of the Optical Society of America B

Year:

2005

Language:

english

File:

PDF, 174 KB

english, 2005

10

Propagation of ultrashort pulses in multimode fiber in space and time

Rokitski, Rostislav, Fainman, Shaya

Journal:

Year:

2003

Language:

english

File:

PDF, 363 KB

english, 2003

11

Time reversal of ultrafast waveforms by wave mixing of spectrally decomposed waves

Marom, Dan, Panasenko, Dmitriy, Rokitski, Rostislav, Sun, Pang-Chen, Fainman, Yeshaiahu

Journal:

Year:

2000

Language:

english

File:

PDF, 366 KB

english, 2000

12

Reply to "Comment on 'Time reversal of ultrafast waveforms by wave mixing spectrally decomposed waves'"

Marom, Dan M., Panasenko, Dmitriy, Rokitski, Rostislav, Sun, Pang-Chen, Fainman, Yeshaiahu

Journal:

Year:

2000

Language:

english

File:

PDF, 42 KB

english, 2000

13

Study of spatial–temporal characteristics of optical fiber based on ultrashort-pulse interferometry

Rokitski, R., Sun, P.-C., Fainman, Y.

Journal:

Year:

2001

Language:

english

File:

PDF, 170 KB

english, 2001

14

Instantaneous Processing of Ultrafast Waveforms By Wave Mixing Spectrally Decomposed Waves

Marom, Dan, Panasenko, Dmitriy, Rokitski, Rostislav, Sun, Pang-Chen, Fainman, Yeshaiahu

Journal:

Optics and Photonics News

Year:

1999

Language:

english

File:

PDF, 375 KB

english, 1999

15

Surface Plasmonic Fields in Nanophotonics

Fainman, Yeshaiahu, Tetz, Kevin, Rokitski, Rostislav, Pang, Lin

Journal:

Optics and Photonics News

Year:

2006

Language:

english

File:

PDF, 2.37 MB

english, 2006

16

SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - Seattle, WA (Sunday 7 July 2002)] Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications VIII - Nonlinear space-time processing of femtosecond laser pulses

Panasenko, Dmitriy, Rokitski, Rostislav I., Marom, Dan M., Mazurenko, Yuri T., Sun, Pang-Chen, Fainman, Yeshaiahu, Yu, Francis T. S., Guo, Ruyan

Year:

2002

Language:

english

File:

PDF, 307 KB

english, 2002

17

SPIE Proceedings [SPIE AeroSense 2002 - Orlando, FL (Monday 1 April 2002)] Holography: A Tribute to Yuri Denisyuk and Emmett Leith - Nonlinear optical information processing with femtosecond pulses

Panasenko, Dmitriy, Rokitski, Rostislav I., Marom, Dan M., Mazurenko, Yuri T., Sun, Pang Chen, Alic, Nikola, Fainman, Yeshaiahu, Caulfield, H. John

Year:

2002

Language:

english

File:

PDF, 578 KB

english, 2002

18

[IEEE The 17th Annual Meeting of the IEEELasers and Electro-Optics Society, 2004. LEOS 2004. - Rio Grande, Puerto Rico (Nov. 8-9, 2004)] The 17th Annual Meeting of the IEEELasers and Electro-Optics Society, 2004. LEOS 2004. - Time-doamin optical processing using chromatic dispersion for ultrashort pulse shaping

Saperstein, R.E., Alic, N., Panasenko, D., Rokitski, R., Fainman, Y.

Year:

2004

Language:

english

File:

PDF, 93 KB

english, 2004

19

[IEEE LEOS 2000. 2000 IEEE Annual Meeting Conference Proceedings - Rio Grande, Puerto Rico (13-16 Nov. 2000)] LEOS 2000. 2000 IEEE Annual Meeting Conference Proceedings. 13th Annual Meeting. IEEE Lasers and Electro-Optics Society 2000 Annual Meeting (Cat. No.00CH37080) - Ultrafast optics for communications and computing

Fainman, Y., Marom, D.M., Panasenko, D., Rokitski, R., Lin, P., Mazurenko, Y.T., Sun, P.C.

Year:

2000

Language:

english

File:

PDF, 156 KB

english, 2000

20

[IEEE International Quantum Electronics Conference, 2005. - San Jose, CA (July 11, 2005)] International Quantum Electronics Conference, 2005. - Ultra short surface plasmon polaritons in photonic crystal structures

Fainman, Y., Tetz, K.A., Rokitski, R., Nezhad, M.

Year:

2005

Language:

english

File:

PDF, 303 KB

english, 2005

21

Excitation and direct imaging of surface plasmon polariton modes in a two-dimensional grating

Tetz, Kevin A., Rokitski, Rostislav, Nezhad, Maziar, Fainman, Yeshaiahu

Journal:

Applied Physics Letters

Year:

2005

Language:

english

File:

PDF, 449 KB

english, 2005

22

Propagation of Femtosecond Surface Plasmon Polariton Pulses on the Surface of a Nanostructured Metallic Film: Space-Time Complex Amplitude Characterization

Rokitski, R., Tetz, K. A., Fainman, Y.

Journal:

Physical Review Letters

Year:

2005

Language:

english

File:

PDF, 1004 KB

english, 2005

23

[IEEE LEOS 2001. 14th Annual Meeting of the IEEE Lasers and Electro-Optics Society - San Diego, CA, USA (12-13 Nov. 2001)] LEOS 2001. 14th Annual Meeting of the IEEE Lasers and Electro-Optics Society (Cat. No.01CH37242) - Nonlinear space-time processing

Fainman, Y., Panasenko, D., Rokitski, R., Marom, D.M., Mazurenko, Y.T., Sun, P.C.

Year:

2001

Language:

english

File:

PDF, 215 KB

english, 2001

24

[IEEE 2005 IEEE LEOS Annual Meeting - Sydney, Australia (23-27 Oct. 2005)] 2005 IEEE LEOS Annual Meeting Conference Proceedings - Nanophotonics for Information Systems Integration

Fainman, Y., Tetz, K., Rokitski, R., Levy, U., Tsai, C.-H., Chen, C.-H., Pang, L., Nezhad, M., Kim, H.C., Abashin, M.

Year:

2005

Language:

english

File:

PDF, 121 KB

english, 2005

25

[IEEE Digest of the LEOS Summer Topical Meetings, 2005. - San Diego, CA, USA (July 25-27, 2005)] Digest of the LEOS Summer Topical Meetings, 2005. - High-speed, electronic arbitrary waveform generation using time domain processing of ultrashort optical pulses

Saperstein, R.E., Alic, N., Rokitski, R., Fainman, Y.

Year:

2005

Language:

english

File:

PDF, 427 KB

english, 2005

26

[IEEE The 17th Annual Meeting of the IEEELasers and Electro-Optics Society, 2004. LEOS 2004. - Rio Grande, Puerto Rico (Nov. 8-9, 2004)] The 17th Annual Meeting of the IEEELasers and Electro-Optics Society, 2004. LEOS 2004. - Excitation and direct imaging of surface plasmon polariton modes in the near-infrared

Tetz, K.A., Rokitski, R., Nezhad, M., Fainman, Y.

Year:

2004

Language:

english

File:

PDF, 115 KB

english, 2004

27

[IEEE The 17th Annual Meeting of the IEEELasers and Electro-Optics Society, 2004. LEOS 2004. - Rio Grande, Puerto Rico (Nov. 8-9, 2004)] The 17th Annual Meeting of the IEEELasers and Electro-Optics Society, 2004. LEOS 2004. - Signal processing, imaging and cryptography with ultrashort laser pulses

Fainman, Y., Saperstein, R., Rokitski, R., Panasenko, D., Alic, N., Marom, D., Mazurenko, Y., Sun, P.C.

Year:

2004

Language:

english

File:

PDF, 64 KB

english, 2004

28

[IEEE 2003 IEEE LEOS Annual Meeting Conference Proceedings - Tucson, AZ, USA (27-28 Oct. 2003)] The 16th Annual Meeting of the IEEE Lasers and Electro-Optics Society, 2003. LEOS 2003. - Applications of optical nonlinearities for signal processing

Fainman, Y., Panasenko, D., Rokitski, R., Saperstein, R., Marom, D.M., Mazurenko, Y.T., Sun, P.C.

Year:

2003

Language:

english

File:

PDF, 182 KB

english, 2003

29

Improving lithography pattern fidelity and line-edge roughness by reducing laser speckle

O. Kritsun, I. Lalovic, S. Rokitski, B. Partlo, B. La Fontaine, N. Farrar, H. Levinson

Year:

2008

Language:

english

File:

PDF, 1.07 MB

english, 2008

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - High power 120W ArF immersion XLR laser system for high dose applications

Rokitski, R., Conley, Will, Rafac, R., Melchior, J., Dubi, R., Thornes, J., Cacouris, T., Haviland, M., Brown, D.

Year:

2013

Language:

english

File:

PDF, 943 KB

english, 2013

31

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Advancements in predictive plasma formation modeling

Panning, Eric M., Goldberg, Kenneth A., Purvis, Michael A., Schafgans, Alexander, Brown, Daniel J. W., Fomenkov, Igor, Rafac, Rob, Brown, Josh, Tao, Yezheng, Rokitski, Slava, Abraham, Mathew, Vargas,

Year:

2016

File:

PDF, 609 KB

2016

32

[IEEE 1999 IEEE LEOS Annual Meeting Conference Proceedings. LEOS'99. 12th Annual Meeting - San Francisco, CA, USA (8-11 Nov. 1999)] 1999 IEEE LEOS Annual Meeting Conference Proceedings. LEOS'99. 12th Annual Meeting. IEEE Lasers and Electro-Optics Society 1999 Annual Meeting (Cat. No.99CH37009) - Instantaneous time reversal of complex amplitude ultrafast waveforms

Marom, D., Panasenko, D., Rokitski, R., Pang-Chen Sun,, Fainman, Y.

Year:

1999

Language:

english

File:

PDF, 204 KB

english, 1999

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Advancements in predictive plasma formation modeling

Panning, Eric M., Goldberg, Kenneth A., Purvis, Michael A., Schafgans, Alexander, Brown, Daniel J. W., Fomenkov, Igor, Rafac, Rob, Brown, Josh, Tao, Yezheng, Rokitski, Slava, Abraham, Mathew, Vargas,

Year:

2016

Language:

english

File:

PDF, 609 KB

english, 2016

34

[IEEE 2005 Conference on Lasers and Electro-Optics (CLEO) - Baltimore, MD, USA (2005.05.27-2005.05.27)] (CLEO). Conference on Lasers and Electro-Optics, 2005. - Sequence estimation with run-length coding for VCSEL-based multimode fiber links

Alic, N., Papen, G.C., Ford, J.E., Saperstein, R.E., Rokitski, R., Fainman, Y.

Year:

2005

Language:

english

File:

PDF, 1.61 MB

english, 2005

35

SPIE Proceedings [SPIE International Conference on Coherent and Nonlinear Optics - St. Petersburg, Russia (Tuesday 27 June 1995)] Nonlinear Optics of Low-Dimensional Structures and New Materials - Photoinduced and electroabsorption spectroscopy studies of a highly stable form of transpolyacetylene

Paraschuk, Dmitri Y., Kulakov, T. A., Rokitski, Rostislav I., Kobryanskii, Valerii M., Emel'yanov, Vladimir I., Panchenko, Vladislav Y.

Year:

1996

Language:

english

File:

PDF, 281 KB

english, 1996

36

SPIE Proceedings [SPIE SPIE Proceedings - (Sunday 12 February 2012)] - Dynamic diffractive optical elements displayed on spatial light modulators

Ambs, Pierre, Bigue, Laurent, Rokitski, Rostislav I., Fainman, Yeshaiahu, Angelsky, Oleg V.

Year:

2012

Language:

english

File:

PDF, 899 KB

english, 2012

37

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - High reliability ArF light source for double patterning immersion lithography

Rokitski, Rostislav, Dusa, Mircea V., Conley, Will, Ishihara, Toshi, Rao, Rajeskar, Jiang, Rui, Haviland, Mary, Cacouris, Theodore, Brown, Daniel

Year:

2010

Language:

english

File:

PDF, 1012 KB

english, 2010

38

SPIE Proceedings [SPIE High-Power Lasers and Applications - San Jose, CA (Saturday 25 January 2003)] Commercial and Biomedical Applications of Ultrafast Lasers III - Real-time synthesis and detection of ultrafast optical waveform

Panasenko, Dmitriy, Rokitski, R., Alic, Nikola, Marom, Dan M., Mazurenko, Yuri T., Sun, Pang Chen, Fainman, Yeshaiahu, Neev, Joseph, Ostendorf, Andreas, Schaffer, Christopher B.

Year:

2003

Language:

english

File:

PDF, 732 KB

english, 2003

39

Big lasers, tiny circuits

Rokitski, Slava

Journal:

Year:

2010

Language:

english

File:

PDF, 342 KB

english, 2010

40

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Enhancing lithography process control through advanced, on-board beam parameter metrology for wafer level monitoring of light source parameters

Choi, Jinphil, Seong, Nakgeuon, Zurita, Omar, Thornes, Joshua, Won, Yookeun, Rokitski, Slava, Kang, Youngseog, Burfeindt, Bernd, Park, Chanhoon, Conley, Will

Year:

2012

Language:

english

File:

PDF, 2.26 MB

english, 2012

41

SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - San Diego, CA (Sunday 30 July 2000)] Algorithms and Systems for Optical Information Processing IV - Nonlinear space-time information processing

Sun, Pang Chen, Marom, Daniel M., Panasenko, Dmitriy, Rokitski, Rostislav I., Lin, Paul C., Oba, Kazutaka, Mazurenko, Yuri T., Fainman, Yeshaiahu, Javidi, Bahram, Psaltis, Demetri

Year:

2000

Language:

english

File:

PDF, 1.94 MB

english, 2000

42

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - XLR 600i: recirculating ring ArF light source for double patterning immersion lithography

Fleurov, Vladimir, Rokitski, Slava, Bergstedt, Robert, Ye, Hong, O’Brien, Kevin, Jacques, Robert, Trintchouk, Fedor, Figueroa, Efrain, Cacouris, Theodore, Brown, Daniel, Partlo, William

Year:

2008

Language:

english

File:

PDF, 482 KB

english, 2008

43

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - XLR 500i: recirculating ring ArF light source for immersion lithography

Brown, D.J. W., Flagello, Donis G., O'Keeffe, P., Fleurov, V. B., Rokitski, R., Bergstedt, R., Fomenkov, I. V., O'Brien, K., Farrar, N. R., Partlo, W. N.

Year:

2007

Language:

english

File:

PDF, 529 KB

english, 2007

44

SPIE Proceedings [SPIE Integrated Optoelectronic Devices 2007 - San Jose, CA (Saturday 20 January 2007)] Optoelectronic Integrated Circuits IX - Nanophotonics for information systems

Nezhad, M., Eldada, Louay A., Lee, El-Hang, Abashin, M., Ikeda, K., Pang, L., Kim, H. C., Levy, U., Tetz, K., Rokitski, R., Fainman, Y.

Year:

2007

Language:

english

File:

PDF, 720 KB

english, 2007

45

SPIE Proceedings [SPIE Integrated Optoelectronic Devices 2006 - San Jose, CA (Saturday 21 January 2006)] Optoelectronic Integrated Circuits VIII - Nanophotonics for integrated information systems

Levy, Uriel, Eldada, Louay A., Lee, El-Hang, Tetz, Kevin, Rokitski, Rostislav, Kim, Hyu-Chang, Tsai, Chia-Ho, Abashin, Maxim, Pang, Lin, Zezhad, Maziar, Fainman, Yeshaiahu

Year:

2006

Language:

english

File:

PDF, 675 KB

english, 2006

46

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Enabling high volume manufacturing of double patterning immersion lithography with the XLR 600ix ArF light source

Rokitski, Rostislav, Levinson, Harry J., Dusa, Mircea V., Fleurov, Vladimir, Bergstedt, Robert, Ye, Hong, Rafac, Robert, Jacques, Robert, Trintchouk, Fedor, Ishihara, Toshihiko, Rao, Rajasekhar, Cacou

Year:

2009

Language:

english

File:

PDF, 307 KB

english, 2009

47

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Scaling LPP EUV sources to meet high volume manufacturing requirements (Conference Presentation)

Panning, Eric M., Goldberg, Kenneth A., Schafgans, Alexander A., Brown, Daniel J., Fomenkov, Igor V., Tao, Yezheng, Purvis, Michael, Rokitski, Slava I., Vaschenko, Georgiy O., Rafac, Robert J., Brandt

Year:

2017

Language:

english

File:

PDF, 114 KB

english, 2017

48

SPIE Proceedings [SPIE Critical Review Collection - Bellingham, United States (Friday 13 January 2017)] Optoelectronic Information Processing: Optics for Information Systems - Nonlinear femtosecond information processing systems

Fainman, Yeshaiahu, Sun, Pang Chen, Marom, Dan M., Mazurenko, Yuri T., Panasenko, Dmitriy, Rokitski, R., Oba, K.

Year:

2017

Language:

english

File:

PDF, 531 KB

english, 2017

49

[OSA CLEO: Applications and Technology - San Jose, California (2017..-..)] Conference on Lasers and Electro-Optics - Industrialization of a Laser Produced Plasma EUV Light Source for Lithography

Fomenkov, I., Schafgans, A., Rokitski, S., Kats, M., Stewart, J., LaForge, A., Ershov, A., Purvis, M., Tao, Y., Vargas, M., Grava, J., Das, P., Urbanski, L., Rafac, R., Lukens, J., Rajyaguru, C., Vasc

Year:

2017

File:

PDF, 9 KB

2017

50

[OSA Frontiers in Optics - Tucson, Arizona (2005..-..)] Frontiers in Optics - Nanophotonic Materials and Devices for Information Systems Integration

Fainman, Yeshaiahu, Tetz, Kevin, Rokitski, Rostislav, Levy, Uriel, Tsai, Chia-Ho, Chen, C.-H., Pang, Lin, Nezhad, Maziar, Kim, H. C., Abashin, Maxim

Year:

2005

Language:

english

File:

PDF, 28 KB

english, 2005